ion sputtering meaning in Chinese
离子溅镀
离子溅射
Examples
- Ion sputtering coator
离子溅射镀膜台 - The theory of ion - beam etching and ion sources are reviewed . the classification of ion - beam etching are introduced . according to the mechanism that ion sputtering leads to faceting , trenching , reflection and redeposition , some relative solutions are put forward
综合叙述了离子束刻蚀技术和离子源的工作原理,简单介绍了离子束刻蚀的分类,阐述了离子束刻蚀的物理溅射效应导致的刻面,开槽,再沉积等现象的产生机理及解决办法,分析了kaufman离子源进行ribe的可行性及出现的问题。 - Surface states and the topmost surface atoms of the batio3 thin films have been analyzed by x - ray photoelectron spectroscopy ( xps ) and angle - resolved x - ray photoelectron spectroscopy ( arxps ) . the results show that the as - grown batio3 thin films have an enriched - bao nonstoichiometric surface layer which can be removed by ar + ion sputtering , and the atomic ratio of ba to ti decreases with increasing the depth of ar + ion sputtering
用x射线光电子能谱技术( xps )和角分辨x射线光电子能谱技术( arxps )研究了薄膜的表面化学态以及最顶层原子种类和分布状况,结果显示在热处理过程中薄膜表面形成一层富含bao的非计量钛氧化物层,并且钡-钛原子浓度比随着探测深度的增大而逐渐减小。 - After 40 hour irradiation time , about 7 ci of radioactive isotope 64cu was produced via 63cu ( n , y ) 64cu reaction . after simple disposal , the irradiated copper sample was installed in the high - intesity ion sputter source on the hi - 13 tandem accelerator . then 64cu ions extracted from the high - intesity ion sputter source and injected into the tandem accelerator , 64cu ions can be accelerated to an energy of 80 mev and formed the off - line rnb since natural
S ）的热中于通量下，经过34个半衰期辐照，通过‘ u … ， y ）生成放射性l司位素‘ cll ，然后将放射性铜靶锥注入串列加速器强流溅射离于源中，引出mcll负离于，经刁串列加速器加速而得到能量为80mcv的离线放射性核束“ cll叭。